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Current issue

ELEKTRO 3/2020 was released on March 13th 2020. Its digital version will be available immediately.

Topic: Trends in electrical engineering

Main Article
Use of frequency converter for experimentational device

SVĚTLO (Light) 2/2020 was released on March 6th 2020. Its digital version will be available immediately.

Market, business, enterprise
BOOBA in new showroom, which surpassed all expectations
Discourse with Technology of Capital city Prague chairman of management

Day light
Diagram of overshadow for 21st march
Modern methods of gaining dates for processing lighting technology assessment

Samsung Announces Industry’s First EUV DRAM

26. 3. 2020 | Samsung | www.samsung.com

Samsung Electronics, the world leader in advanced memory technology, today announced that it has successfully shipped one million of the industry’s first 10nm-class (D1x) DDR4 (Double Date Rate 4) DRAM modules based on extreme ultraviolet (EUV) technology.

The new EUV-based DRAM modules have completed global customer evaluations, and will open the door to more cutting-edge EUV process nodes for use in premium PC, mobile, enterprise server and datacenter applications. Samsung is the first to adopt EUV in DRAM production to overcome challenges in DRAM scaling. EUV technology reduces repetitive steps in multi-patterning and improves patterning accuracy, enabling enhanced performance and greater yields as well as shortened development time.

Samsung DRAM with EUV

EUV will be fully deployed in Samsung’s future generations of DRAM, starting with its fourth-generation 10nm-class (D1a) or the highly-advanced 14nm-class, DRAM. Samsung expects to begin volume production of D1a-based DDR5 and LPDDR5 next year, which would double manufacturing productivity of the 12-inch D1x wafers.

Read more at Samsung

Image Credit: Pexels

-jk-